A research partnership led by Lawrence Livermore National Laboratory (LLNL) has been formed to investigate the next evolution of extreme ultraviolet (EUV) lithography. The team will participate in the ...

This enables the EUV lithography era of today, which is likely to continue for the foreseeable future. Initially, EUV became ...

Photolithography at a wavelength of 193 nm in the deep UV with water immersion lenses ... Interestingly, DUV lithography at a wavelength of 193 nm has dominated the field much longer than ...

A lithography machine is crucial equipment for semiconductor manufacturing, applying short-wavelength ultraviolet light to make integrated circuit chips with various layouts. However, traditional ...

Let us help you with your inquiries, brochures and pricing requirements Request A Quote Download PDF Copy Download Brochure The EVG610 UV nanoimprint lithography tool ...

Extreme ultraviolet (EUV) lithography is the next step in this trend. It uses radiation of wavelength 13.5 nm, thereby offering significant potential to extend the resolution of photolithography ...

A new technical paper titled “Sensitivity and contrast of indium nitrate hydrate resist evaluated by low-energy electron beam ...

Next, this photoresist is exposed to a pattern of ultraviolet light created by a photomask ... The processing has been developed and demonstrated with an interferometric lithography tool. Ongoing work ...

Corning has introduced its new ultra-low expansion (ULE) material that is designed to withstand ever increasing power of upcoming Low-NA (Numerical Aperture) and High-NA EUV lithography systems.

Let us help you with your inquiries, brochures and pricing requirements Request A Quote Download PDF Copy Download Brochure The EVG7300 automated UV nanoimprint ...